DocumentCode
1092779
Title
Relationship between junction radius and reverse leakage of silicide Schottky-barrier diodes
Author
Drobny, Vladimir F.
Author_Institution
Tektronix Inc., Beaverton, OR
Volume
31
Issue
7
fYear
1984
fDate
7/1/1984 12:00:00 AM
Firstpage
895
Lastpage
899
Abstract
Unguarded Schottky-barrier diodes exhibit excessive leakage current in the reverse-current direction. A portion of this excess current has always been attributed to sharp-edge effects. In this paper, the sharp-edge-related excess reverse current is attributed to the additional barrier lowering that is due to the electric-field enhancement present near the diode edges. Mathematical relationships describing the effect of the edge radius on the I-V characteristics of unguarded diodes are developed. These relationships are then used to model an unguarded Schottky-barrier diode. The correlation between the junction radius and the diode characteristics was found to be strong in the reverse-current direction. In the foward direction, the diode characteristics were not greatly affected, and thus the large diode-quality factors of unguarded diodes cannot be attributed to the sharp-edge effect. A comparison is made between the experimental characteristics of Pd2 Si/ nSi and VSi2 /nSi diodes and those obtained from modeling.
Keywords
Degradation; Electric resistance; Electrons; P-n junctions; Schottky diodes; Silicides; Silicon; Temperature; Very large scale integration; Voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1984.21627
Filename
1483912
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