• DocumentCode
    1092779
  • Title

    Relationship between junction radius and reverse leakage of silicide Schottky-barrier diodes

  • Author

    Drobny, Vladimir F.

  • Author_Institution
    Tektronix Inc., Beaverton, OR
  • Volume
    31
  • Issue
    7
  • fYear
    1984
  • fDate
    7/1/1984 12:00:00 AM
  • Firstpage
    895
  • Lastpage
    899
  • Abstract
    Unguarded Schottky-barrier diodes exhibit excessive leakage current in the reverse-current direction. A portion of this excess current has always been attributed to sharp-edge effects. In this paper, the sharp-edge-related excess reverse current is attributed to the additional barrier lowering that is due to the electric-field enhancement present near the diode edges. Mathematical relationships describing the effect of the edge radius on the I-V characteristics of unguarded diodes are developed. These relationships are then used to model an unguarded Schottky-barrier diode. The correlation between the junction radius and the diode characteristics was found to be strong in the reverse-current direction. In the foward direction, the diode characteristics were not greatly affected, and thus the large diode-quality factors of unguarded diodes cannot be attributed to the sharp-edge effect. A comparison is made between the experimental characteristics of Pd2Si/ nSi and VSi2/nSi diodes and those obtained from modeling.
  • Keywords
    Degradation; Electric resistance; Electrons; P-n junctions; Schottky diodes; Silicides; Silicon; Temperature; Very large scale integration; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1984.21627
  • Filename
    1483912