DocumentCode :
1093143
Title :
Dislocations as the origin of threshold voltage scatterings for GaAs MESFET on LEC-grown semi-insulating GaAs substrate
Author :
Miyazawa, Shintaro ; Ishii, Yasunobu
Author_Institution :
Nippon Telegraph and Telephone Public Corporation, Kanagawa, Japan
Volume :
31
Issue :
8
fYear :
1984
fDate :
8/1/1984 12:00:00 AM
Firstpage :
1057
Lastpage :
1062
Abstract :
This paper describes the extended results on the influence of dislocations in liquid-encapsulated Czochralski (LEC) grown semi-insulating GaAs substrates on threshold voltage of GaAs MESFET´s. MESFET´s located less than about 50 µm from a dislocation exhibit threshold voltage lower than those far from a dislocation and threshold voltage scatters at less than about 30 µm from a dislocation. The scattering is considered briefly from anisotropy of stress field around dislocations. Particular interest is devoted to the electrical properties around dislocations because of their detrimental influence on the FET threshold voltage.
Keywords :
Crystals; Etching; FETs; Gallium arsenide; Gold; Lithography; MESFETs; Scattering; Substrates; Threshold voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1984.21660
Filename :
1483945
Link To Document :
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