DocumentCode :
1093729
Title :
Strip waveguides in LiNbO3fabricated by combined metal diffusion and ion implantation
Author :
Heibei, Jürgen ; Voges, Edgar
Author_Institution :
Draegerwerk Lübeck, Germany
Volume :
18
Issue :
5
fYear :
1982
fDate :
5/1/1982 12:00:00 AM
Firstpage :
820
Lastpage :
825
Abstract :
Embedded strip waveguides in LiNbO3are fabricated by a titanium in-diffusion followed by a masked implantation of helium ions which reduces the refractive index in the unmasked regions and confines the optical wave. This technique yields waveguides with well-defined lateral dimensions and strong optical confinement. The index profiles of helium implanted LiNbO3are determined with an index reduction of more than 1 percent up to about 1 μm depth for 350 keV He+ ions at a dose \\Phi \\simeq 10^{16} cm-2. Electrooptic devices with self-aligned electrodes are fabricated by using the implantation mask as a lift-off mask, and Mach-Zehndet type interferometers are investigated.
Keywords :
Electrooptic materials/devices; Integrated-circuit ion implantation; Optical strip waveguides; Electrooptic devices; Helium; Optical interferometry; Optical refraction; Optical variables control; Optical waveguides; Particle beam optics; Refractive index; Strips; Titanium;
fLanguage :
English
Journal_Title :
Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9197
Type :
jour
DOI :
10.1109/JQE.1982.1071615
Filename :
1071615
Link To Document :
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