DocumentCode :
1094258
Title :
Characteristic Features of 1-D Ballistic Transport in Nanowire MOSFETs
Author :
Kim, Raseong ; Lundstrom, Mark S.
Author_Institution :
Sch. of Electr. & Comput. Eng., Purdue Univ., West Lafayette, IN
Volume :
7
Issue :
6
fYear :
2008
Firstpage :
787
Lastpage :
794
Abstract :
In this paper, we theoretically investigate characteristic features of 1-D, ballistic transport in nanowire (NW) MOSFETs. An analytic model at T = 0 K is first derived using the top-of-the-barrier ballistic transport model. When the drain voltage is low, this model shows that the drain current increases stepwise with increasing gate voltage, and the transconductance vs. gate voltage displays spikes. These features are the most evident signatures of 1-D transport. Next, we examine the finite-temperature performance numerically and show how I-V characteristics change as device parameters and temperature are varied. Finally, recently reported silicon NW gate-all-around MOSFETs are analyzed with our model. We show that some quantum features of these experiments can be explained with our simple, ballistic model. This approach may be a possible tool for subband spectroscopy and device performance assessment.
Keywords :
MOSFET; ballistic transport; elemental semiconductors; nanowires; semiconductor device models; semiconductor quantum wires; silicon; 1D ballistic transport model; I-V characteristics; Si; drain current; drain voltage; silicon nanowire MOSFETs; subband spectroscopy; transconductance; Ballistic transport; MOSFETs; ballistic transport; nanowire (NW) transistor; nanowire transistor; quantum wires; semiconductor device modeling;
fLanguage :
English
Journal_Title :
Nanotechnology, IEEE Transactions on
Publisher :
ieee
ISSN :
1536-125X
Type :
jour
DOI :
10.1109/TNANO.2008.920196
Filename :
4468038
Link To Document :
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