DocumentCode :
1094343
Title :
Transport study in Si-silicide-Si transistors using a Monte Carlo technique
Author :
Abdeshaah, Rahim ; Wang, K.L.
Author_Institution :
University of California, Los Angeles, CA
Volume :
31
Issue :
12
fYear :
1984
fDate :
12/1/1984 12:00:00 AM
Firstpage :
1701
Lastpage :
1708
Abstract :
The Monte Carlo technique has been used for the study of electron motion in a proposed Si-silicide-Si transistor (SST). The transmission coefficient and the transit time are calculated as functions of lattice temperature, initial energy of electrons coming from the emitter, and the applied base-collector bias. The results show that a maximum transmission coefficient for electrons occurs when the initial energy exceeds the maximum energy barrier of the base-collector junction by about 0.1 eV, and the transit time decreases as the applied base-collector junction bias increases and as the temperature decreases. Space charge effects caused by operating at high current densities are shown to reduce slightly the transmission coefficient.
Keywords :
Electron emission; Gold; Lattices; Molecular beam epitaxial growth; Monte Carlo methods; Reflection; Scattering; Silicides; Temperature; Transistors;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1984.21774
Filename :
1484059
Link To Document :
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