DocumentCode :
1094404
Title :
Monte Carlo simulation of bipolar transistors
Author :
Park, Young-June ; Navon, David H. ; Tang, Ting-wei
Author_Institution :
IBM General Technology Division, Hopewell Junction, NY
Volume :
31
Issue :
12
fYear :
1984
fDate :
12/1/1984 12:00:00 AM
Firstpage :
1724
Lastpage :
1730
Abstract :
A new approach is proposed to investigate, the limits of validity of the conventional drift-diffusion equation analysis for modeling bipolar transistor structures containing submicrometer dimensions. The single-particle Monte Carlo method is used for the solution of the Boltzmann equation. An electron velocity overshoot of 1.8 times the static saturation velocity has been found for electrons near the base-collector junction of a silicon device. The effect of this velocity overshoot was calculated to enhance the output collector current and reduce the electron transit time by 5 percent for the device structure considered in this work.
Keywords :
Bipolar transistors; Boltzmann equation; Current density; Electron mobility; Helium; Hot carriers; MOSFET circuits; Monte Carlo methods; Particle scattering; Silicon;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1984.21778
Filename :
1484063
Link To Document :
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