DocumentCode
1094409
Title
Excitation of accelerating wakefields in inhomogeneous plasmas
Author
Shvets, G. ; Wurtele, J.S. ; Chiou, T.C. ; Katsouleas, Thomas C.
Author_Institution
Plasma Phys. Lab., Princeton Univ., NJ, USA
Volume
24
Issue
2
fYear
1996
fDate
4/1/1996 12:00:00 AM
Firstpage
351
Lastpage
362
Abstract
The excitation of the wakefields in an inhomogeneous plasma by a short laser pulse is investigated theoretically. A general equation for the wake excitation in transversely nonuniform plasma is derived. This equation is applied to the step-function density profile model of hollow channel laser wakefield accelerator. A more realistic model, in which the transition between the evacuated channel and the homogeneous surrounding plasma occurs over a finite radial extent, is then analyzed. It is shown that the excited channel made can interact resonantly with the plasma electrons inside the channel wall, leading to secular growth of the electric field. This eventually results in wavebreaking and the dissipation of the accelerating mode. We introduce an effective quality factor Q for the hollow channel laser wakefield geometry. This resonance limits the number of electron bunches that can be accelerated in the wake of single laser pulse
Keywords
beam handling techniques; collective accelerators; electron accelerators; high-speed optical techniques; plasma density; wakefield accelerators; accelerating mode dissipation; accelerating wakefields excitation; channel wall; effective quality factor; electric field; electron bunches; evacuated channel; excited channel made; finite radial extent; hollow channel laser wakefield accelerator; homogeneous surrounding plasma; inhomogeneous plasmas; secular growth; short laser pulse; single laser pulse; step-function density profile model; transversely nonuniform plasma; wake excitation; wavebreaking; Acceleration; Equations; Laser excitation; Laser modes; Laser theory; Laser transitions; Optical pulses; Plasma accelerators; Plasma density; Plasma waves;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/27.509999
Filename
509999
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