DocumentCode :
1094559
Title :
Analysis of chemical degradation products in an e-beam pumped rare-gas halide laser
Author :
Brannon, James H.
Author_Institution :
Maxwell Laboratories, Inc., San Diego, CA, USA
Volume :
18
Issue :
8
fYear :
1982
fDate :
8/1/1982 12:00:00 AM
Firstpage :
1302
Lastpage :
1305
Abstract :
Chemical degradation products created during the operation of an e -beam pumped, repetitively pulsed XeF laser with closed flow cycle capability are reported. From an initial lasing mixture of Ar/Xe/NF3, the degraded gas was found to contain N2F2(N2F4), CO2, nitrogen oxides, CF4, and SiF4. Gaseous species were identified by their infrared and ultraviolet absorption spectra. Also present was a solid material tentatively thought to consist of fluorocarbons and aluminum fluorides. The observed gas chemistry suggests methods for improving laser performance by prevention of contaminant buildup.
Keywords :
Noble-gas lasers; Pulsed lasers; Argon; Chemical analysis; Chemical lasers; Chemical products; Degradation; Gas lasers; Laser excitation; Noise measurement; Optical pulses; Pump lasers;
fLanguage :
English
Journal_Title :
Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9197
Type :
jour
DOI :
10.1109/JQE.1982.1071690
Filename :
1071690
Link To Document :
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