DocumentCode
1094559
Title
Analysis of chemical degradation products in an e-beam pumped rare-gas halide laser
Author
Brannon, James H.
Author_Institution
Maxwell Laboratories, Inc., San Diego, CA, USA
Volume
18
Issue
8
fYear
1982
fDate
8/1/1982 12:00:00 AM
Firstpage
1302
Lastpage
1305
Abstract
Chemical degradation products created during the operation of an
-beam pumped, repetitively pulsed XeF laser with closed flow cycle capability are reported. From an initial lasing mixture of Ar/Xe/NF3 , the degraded gas was found to contain N2 F2 (N2 F4 ), CO2 , nitrogen oxides, CF4 , and SiF4 . Gaseous species were identified by their infrared and ultraviolet absorption spectra. Also present was a solid material tentatively thought to consist of fluorocarbons and aluminum fluorides. The observed gas chemistry suggests methods for improving laser performance by prevention of contaminant buildup.
-beam pumped, repetitively pulsed XeF laser with closed flow cycle capability are reported. From an initial lasing mixture of Ar/Xe/NFKeywords
Noble-gas lasers; Pulsed lasers; Argon; Chemical analysis; Chemical lasers; Chemical products; Degradation; Gas lasers; Laser excitation; Noise measurement; Optical pulses; Pump lasers;
fLanguage
English
Journal_Title
Quantum Electronics, IEEE Journal of
Publisher
ieee
ISSN
0018-9197
Type
jour
DOI
10.1109/JQE.1982.1071690
Filename
1071690
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