DocumentCode
1094734
Title
Short-channel threshold model for buried-channel MOSFET´s
Author
Huang, J.S.T. ; Schrankler, Jay W. ; Kueng, J.S.
Author_Institution
Honeywell, Inc., Plymouth, MN
Volume
31
Issue
12
fYear
1984
fDate
12/1/1984 12:00:00 AM
Firstpage
1889
Lastpage
1895
Abstract
An analytical closed-form expression for the short-channel threshold voltage of a normally-OFF-type buried-channel MOSFET (BC-MOSFET) was derived. The model is based on the increase in majority-carrier concentration along the channel and the substrate charge sharing property between source-drain and the channel. This model is able to predict the condition under which the magnitude of the threshold voltage can initially increase and then falls off precipitously as the channel length gradually decreases. Good agreement between theory and experiment was obtained with the p-channel BC-MOSFET used in the CMOS circuit.
Keywords
Boron; CMOS technology; Doping; MOSFET circuits; Neodymium; P-n junctions; Predictive models; Semiconductor device modeling; Solid state circuits; Threshold voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1984.21806
Filename
1484091
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