• DocumentCode
    1094734
  • Title

    Short-channel threshold model for buried-channel MOSFET´s

  • Author

    Huang, J.S.T. ; Schrankler, Jay W. ; Kueng, J.S.

  • Author_Institution
    Honeywell, Inc., Plymouth, MN
  • Volume
    31
  • Issue
    12
  • fYear
    1984
  • fDate
    12/1/1984 12:00:00 AM
  • Firstpage
    1889
  • Lastpage
    1895
  • Abstract
    An analytical closed-form expression for the short-channel threshold voltage of a normally-OFF-type buried-channel MOSFET (BC-MOSFET) was derived. The model is based on the increase in majority-carrier concentration along the channel and the substrate charge sharing property between source-drain and the channel. This model is able to predict the condition under which the magnitude of the threshold voltage can initially increase and then falls off precipitously as the channel length gradually decreases. Good agreement between theory and experiment was obtained with the p-channel BC-MOSFET used in the CMOS circuit.
  • Keywords
    Boron; CMOS technology; Doping; MOSFET circuits; Neodymium; P-n junctions; Predictive models; Semiconductor device modeling; Solid state circuits; Threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1984.21806
  • Filename
    1484091