• DocumentCode
    1094805
  • Title

    Geometry dependence of dark current in CCD´s

  • Author

    Chen, John Y. ; Viswanathan, C.R.

  • Author_Institution
    Xerox Palo Alto Research Center, Palo Alto, CA
  • Volume
    31
  • Issue
    12
  • fYear
    1984
  • fDate
    12/1/1984 12:00:00 AM
  • Firstpage
    1914
  • Lastpage
    1916
  • Abstract
    This paper studies the scalability of dark current in reduced-geometry CCD´s. The dependence of dark current on device geometry is measured from test CCD´s with various channel widths. We found that dark current does not scale with channel width due to the peripheral leakage generated at the edges of the channel stops. A simple model is proposed to separate the peripheral contribution from the leakage generated within the CCD cell. It is concluded that the peripheral contribution becomes a dominant leakage source in narrow-channel CCD´s, and the bucket fill time decreases as the channel width is reduced.
  • Keywords
    Bipolar transistors; Charge coupled devices; DRAM chips; Dark current; Electron devices; Equations; Geometry; Hot carriers; Leakage current; Temperature;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1984.21814
  • Filename
    1484099