DocumentCode :
1094805
Title :
Geometry dependence of dark current in CCD´s
Author :
Chen, John Y. ; Viswanathan, C.R.
Author_Institution :
Xerox Palo Alto Research Center, Palo Alto, CA
Volume :
31
Issue :
12
fYear :
1984
fDate :
12/1/1984 12:00:00 AM
Firstpage :
1914
Lastpage :
1916
Abstract :
This paper studies the scalability of dark current in reduced-geometry CCD´s. The dependence of dark current on device geometry is measured from test CCD´s with various channel widths. We found that dark current does not scale with channel width due to the peripheral leakage generated at the edges of the channel stops. A simple model is proposed to separate the peripheral contribution from the leakage generated within the CCD cell. It is concluded that the peripheral contribution becomes a dominant leakage source in narrow-channel CCD´s, and the bucket fill time decreases as the channel width is reduced.
Keywords :
Bipolar transistors; Charge coupled devices; DRAM chips; Dark current; Electron devices; Equations; Geometry; Hot carriers; Leakage current; Temperature;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1984.21814
Filename :
1484099
Link To Document :
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