DocumentCode
1095119
Title
IIB-5 improved sidewall masked isolation process
Author
Teng, C.W. ; Pollack, G. ; Scott, D. ; Hunter, W.R.
Volume
31
Issue
12
fYear
1984
fDate
12/1/1984 12:00:00 AM
Firstpage
1966
Lastpage
1966
Keywords
Diodes; Etching; Leakage current; Oxidation; Process design; Rapid thermal processing; Silicon; Temperature measurement; Thermal stresses; Very large scale integration;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1984.21838
Filename
1484123
Link To Document