• DocumentCode
    1095132
  • Title

    IIB-6 recent advances in the rapid thermal annealing of boron and BF2+implanted source-drain junctions for submicrometer CMOS technology

  • Author

    Vasudev, P.K. ; Schmitz, A. ; Olson, G.L.

  • Volume
    31
  • Issue
    12
  • fYear
    1984
  • fDate
    12/1/1984 12:00:00 AM
  • Firstpage
    1966
  • Lastpage
    1966
  • Keywords
    Alpha particles; Boron; CMOS technology; Conductivity; Implants; Laboratories; P-n junctions; Pulsed power supplies; Rapid thermal annealing; Temperature measurement;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1984.21839
  • Filename
    1484124
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1095132