• DocumentCode
    1095469
  • Title

    Effects related to dose deposition profiles in integrated optics structures

  • Author

    West, R.H. ; Dowling, S.

  • Author_Institution
    Royal Mil. Coll. of Sci., Cranfield Univ., Swindon, UK
  • Volume
    43
  • Issue
    3
  • fYear
    1996
  • fDate
    6/1/1996 12:00:00 AM
  • Firstpage
    1044
  • Lastpage
    1049
  • Abstract
    Results from exposures of lithium tantalate and lithium niobate integrated optic structures to pulses of high energy X-rays and fast electrons are related to dose and charge deposition profiles. Anomalous effects in the tantalate are ascribed to induced electric fields
  • Keywords
    X-ray effects; electron beam effects; integrated optics; lithium compounds; LiNbO3; LiTaO3; anomalous effects; charge deposition profiles; dose deposition profiles; fast electrons; high energy X-rays; induced electric fields; integrated optics structures; Electron optics; Integrated optics; Lithium compounds; Lithium niobate; Optical materials; Optical pulses; Optical refraction; Optical scattering; Optical variables control; X-rays;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/23.510753
  • Filename
    510753
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1095469