Title :
Investigation of effect of strain on low-threshold 1.3 μm InGaAsP strained-layer quantum well lasers
Author :
Tsuchiya, Takao ; Komori, M. ; Uomi, K. ; Oka, Akira ; Kawano, T. ; Oishi, A.
Author_Institution :
Central Res. Lab., Hitachi Ltd., Tokyo
fDate :
5/12/1994 12:00:00 AM
Abstract :
The authors have investigated the effect of strain on 1.3 μm InGaAsP lasers under the same well thickness (6 nm) and same lasing wavelength (1.34 μm) by changing the In and As contents. The maximum photoluminescence intensity, the narrowest photoluminescence full width at half maximum (23 meV), and minimum threshold current density (450 A/cm2) were obtained for 1.4% compressive strain. Moreover, a very low CW threshold current (1.3 mA) was also achieved in a 90-70% coated 200 μm long device
Keywords :
III-V semiconductors; gallium arsenide; gallium compounds; indium compounds; luminescence of inorganic solids; photoluminescence; semiconductor lasers; 1.3 mA; 1.3 mum; 1.34 mum; 200 mum; InGaAsP; InGaAsP strained-layer quantum well lasers; coated long device; compressive strain; lasing wavelength; low-threshold; maximum photoluminescence intensity; minimum threshold current density; narrowest photoluminescence full width at half maximum; strain effects; very low CW threshold current; well thickness;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19940560