DocumentCode :
1095624
Title :
Performance predictions of scaled BiCMOS gates using physical simulation
Author :
Arnborg, Torkel
Author_Institution :
Texas Instrum. Inc., Dallas, TX, USA
Volume :
27
Issue :
5
fYear :
1992
fDate :
5/1/1992 12:00:00 AM
Firstpage :
754
Lastpage :
760
Abstract :
The necessary reduction in supply voltage for future scaled-down BiCMOS technologies will cause a degradation in speed because the base-emitter forward voltage drop is not scaled. The analysis of how the performance difference between BiCMOS and CMOS changes with scaling has been ambiguous in previous work because of insufficient model accuracy. In this work, mixed-level device-circuit simulation with accurate numerical device models, used to predict gate delay, output voltage drop, breakdown voltage and hot-carrier reliability estimates for BiCMOS and CMOS structures with different scaling, is described. A very significant result was that for 0.25-μm feature size the bipolar part of BiCMOS will still contribute to performance if the fan-out is high and if appropriate scaling including doping, supply voltage, vertical dimensions, and lateral dimensions is used
Keywords :
BIMOS integrated circuits; circuit reliability; delays; digital simulation; electric breakdown of solids; hot carriers; integrated logic circuits; logic gates; semiconductor device models; 0.25 micron; breakdown voltage; gate delay; hot-carrier reliability estimates; mixed-level device-circuit simulation; numerical device models; output voltage drop; performance predictions; physical simulation; scaled BiCMOS gates; BiCMOS integrated circuits; CMOS technology; Degradation; Delay estimation; Numerical models; Numerical simulation; Performance analysis; Predictive models; Semiconductor device modeling; Voltage;
fLanguage :
English
Journal_Title :
Solid-State Circuits, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9200
Type :
jour
DOI :
10.1109/4.133162
Filename :
133162
Link To Document :
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