Title :
Capacitively Coupled Plasma With Widely Spaced Confinement Grid
Author :
Kenney, Jason A. ; Rauf, Shahid ; Collins, Ken
Author_Institution :
Appl. Mater., Inc., Sunnyvale, CA
Abstract :
A 3-D plasma model is used to understand the behavior of a capacitively coupled plasma in the vicinity of widely spaced (relative to sheath thickness) metal lines. It is found that electron power deposition is enhanced adjacent to the metal grid, increasing the local plasma density. In addition, the electrically discontinuous nature of the metal grid is observed to azimuthally perturb the plasma up to several centimeters from the metal grid lines.
Keywords :
high-frequency discharges; plasma density; plasma materials processing; plasma sheaths; plasma simulation; 3D plasma model; capacitively coupled plasma behavior; electron power deposition; local plasma density; metal grid; plasma sheath thickness; widely spaced confinement grid; 3-D plasma modeling; Capacitively coupled; confinement grid;
Journal_Title :
Plasma Science, IEEE Transactions on
DOI :
10.1109/TPS.2008.917787
