DocumentCode :
109614
Title :
High-Speed 501-Stage DCFL GaN Ring Oscillator Circuits
Author :
Corrion, A.L. ; Shinohara, K. ; Regan, D. ; Tang, Yuchen ; Brown, Dean ; Robinson, J.F. ; Fung, Helen H. ; Schmitz, A. ; Le, Dat ; Kim, Sun Ja ; Oh, Thomas C. ; Micovic, M.
Author_Institution :
HRL Labs., LLC, Malibu, CA, USA
Volume :
34
Issue :
7
fYear :
2013
fDate :
Jul-13
Firstpage :
846
Lastpage :
848
Abstract :
Direct-coupled field-effect transistor (FET) logic inverters and 501-stage ring oscillators (ROs) are fabricated using highly scaled GaN heterojunction FET with gate lengths of 20 and 40 nm. A 40-nm gate-length E/D inverter has logic-low and logic-high noise margins of 0.465 and 1.59 V, respectively, and a logic voltage swing of 2.38 V measured at Vdd = 2.5 V. The corresponding 40-nm 501-stage RO frequency and stage delay are 0.067 GHz and 15 ps, whereas the frequency and stage delay of a 20-nm RO are 0.133 GHz and 7.5 ps. The yield of the 20-nm 501-stage RO circuits is 52% across a 3-in diameter wafer. With 1006 transistors, the 501-stage ROs represent the highest level of transistor integration to date for a GaN circuit, whereas the stage delay is the shortest reported for a GaN digital circuit.
Keywords :
HEMT integrated circuits; III-V semiconductors; field effect logic circuits; gallium compounds; high electron mobility transistors; logic gates; oscillators; wide band gap semiconductors; DCFL ring oscillator circuits; GaN; digital circuit; direct coupled field effect transistor; heterojunction FET; logic inverters; size 20 nm; size 40 nm; transistor integration; voltage 0.465 V; voltage 1.59 V; voltage 2.38 V; Direct-coupled FET logic (DCFL); gallium nitride (GaN); heterojunction field-effect transistor (HFET); high-electron mobility transistor (HEMT); inverter; ring oscillator;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2013.2264796
Filename :
6542646
Link To Document :
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