• DocumentCode
    1096489
  • Title

    Determining specific contact resistivity from contact end resistance measurements

  • Author

    Chern, J.G.J. ; Oldham, W.G.

  • Author_Institution
    University of California, Berkeley, CA
  • Volume
    5
  • Issue
    5
  • fYear
    1984
  • fDate
    5/1/1984 12:00:00 AM
  • Firstpage
    178
  • Lastpage
    180
  • Abstract
    A method is described to determine specific contact resistivity from contact end resistance measurements using a transmission line model. A test pattern is described which minimizes the effect of current fringing around contact corners and yields an accurate determination of contact width. With this pattern, the specific contact resistivities measured on 1.3 wt % Si/Al contacts to n+ silicon junctions with different dopings show very consistent values and are independent of contact geometries. The dependence of measured specific contact resistivities on doping concentration is also in good agreement with the predictions of tunneling theory. Surprisingly, the dependence on surface concentration extends well beyond the usual range of electrically active solid solubility.
  • Keywords
    Conductivity; Contacts; Doping; Electrical resistance measurement; Geometry; Semiconductor process modeling; Silicon; Testing; Transmission line measurements; Transmission line theory;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/EDL.1984.25875
  • Filename
    1484251