DocumentCode
1097264
Title
Source-and-drain series resistance of LDD MOSFET´s
Author
Sheu, B.J. ; Hu, C. ; Ko, P.K. ; Hsu, F.-C.
Author_Institution
University of California, Berkeley, CA
Volume
5
Issue
9
fYear
1984
fDate
9/1/1984 12:00:00 AM
Firstpage
365
Lastpage
367
Abstract
The introduction of n- regions makes an LDD MOSFET behave differently from a conventional MOSFET. The source-and-drain series resistance, which consists of the n+-and-n-regions, shows a strong dependence on the gate bias. Also, the apparent effective length can vary with gate bias. These special features cause the traditional method to determine effective channel length and series resistance inapplicable. In this letter, we propose a method to determine the "intrinsic" channel length and gate-voltage-dependent source-and-drain series resistance of an LDD MOSFET and a modal for the LDD device current at small drain-source voltage.
Keywords
Capacitance; Electrical resistance measurement; Implants; Length measurement; MOS devices; MOSFET circuits; Radio frequency; Safety; Testing; Threshold voltage;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/EDL.1984.25948
Filename
1484324
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