• DocumentCode
    1097264
  • Title

    Source-and-drain series resistance of LDD MOSFET´s

  • Author

    Sheu, B.J. ; Hu, C. ; Ko, P.K. ; Hsu, F.-C.

  • Author_Institution
    University of California, Berkeley, CA
  • Volume
    5
  • Issue
    9
  • fYear
    1984
  • fDate
    9/1/1984 12:00:00 AM
  • Firstpage
    365
  • Lastpage
    367
  • Abstract
    The introduction of n- regions makes an LDD MOSFET behave differently from a conventional MOSFET. The source-and-drain series resistance, which consists of the n+-and-n-regions, shows a strong dependence on the gate bias. Also, the apparent effective length can vary with gate bias. These special features cause the traditional method to determine effective channel length and series resistance inapplicable. In this letter, we propose a method to determine the "intrinsic" channel length and gate-voltage-dependent source-and-drain series resistance of an LDD MOSFET and a modal for the LDD device current at small drain-source voltage.
  • Keywords
    Capacitance; Electrical resistance measurement; Implants; Length measurement; MOS devices; MOSFET circuits; Radio frequency; Safety; Testing; Threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/EDL.1984.25948
  • Filename
    1484324