DocumentCode :
1097506
Title :
New technique for measurement of electron saturation velocity in GaAs MESFET´s
Author :
Lee, K.W. ; Shur, M.S. ; Vu, T.T.
Author_Institution :
University of Minnesota, Minneapolis, MN
Volume :
5
Issue :
10
fYear :
1984
fDate :
10/1/1984 12:00:00 AM
Firstpage :
426
Lastpage :
427
Abstract :
A new technique for the measurement of the electron saturation velocity in GaAs FET\´s is proposed using the "end" resistance measurement. The measurements performed on 1.3-µm gate-length ion-implanted GaAs MESFET\´s lead to the values of the saturation velocity ranging from 1 to 1.3 × 105m/s.
Keywords :
Electrical resistance measurement; Electron mobility; Gallium arsenide; MESFETs; Microelectronics; Ohmic contacts; Proximity effect; Thermal factors; Velocity measurement; Voltage;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1984.25972
Filename :
1484348
Link To Document :
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