Title :
Two-dimensional analytical modeling of threshold voltages of short-channel MOSFET´s
Author :
Poole, D.R. ; Kwong, D.L.
Author_Institution :
University of Notre Dame, Notre Dame, IN
fDate :
11/1/1984 12:00:00 AM
Abstract :
We present an analytical model of the threshold voltage of a short-channel MOSFET based on an explicit solution of two-dimensional Poisson´s equation in the depletion region under the gate. This model predicts an exponential dependence on channel length (L), a linear dependence on drain voltage (VD), and an inverse dependence on oxide capacitance (εox/tox). An attractive feature of this model is that it provides an analytical closed-form expression for the threshold voltage as a function of material and device parameters (tox, VD, L, substrate bias, and substrate doping concentration) without making premature approximations. Also, this expression reduces to the corresponding expression for long-channel devices.
Keywords :
Analytical models; Boundary conditions; Capacitance; Doping; MOSFET circuits; Numerical analysis; Poisson equations; Predictive models; Semiconductor process modeling; Threshold voltage;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/EDL.1984.25981