DocumentCode
1097917
Title
Total Ionizing Dose Effects in NOR and NAND Flash Memories
Author
Cellere, Giorgio ; Paccagnella, Alessandro ; Visconti, Angelo ; Bonanomi, Mauro ; Beltrami, S. ; Schwank, Jim R. ; Shaneyfelt, Marty R. ; Paillet, Philippe
Author_Institution
Padova Univ., Padova
Volume
54
Issue
4
fYear
2007
Firstpage
1066
Lastpage
1070
Abstract
We irradiated floating gate (FG) memories with nor and nand architecture by using different TID sources, including 2 MeV, 98 MeV, and 105 MeV protons, X-rays, and Upsi-rays. Two classes of phenomena are responsible for charge loss from programmed FGs: the first is charge generation, recombination, and transport in the dielectrics, while the second is the emission of electrons above the oxide band. Charge loss from programmed FGs irradiated with protons of different energy closely tracks results from Upsi-rays, whereas the use of X-rays results in dose enhancement effects.
Keywords
electron emission; flash memories; NAND flash memories; NOR flash memories; charge loss; electron emission; total ionizing dose effects; Degradation; Dielectric losses; Dielectric substrates; Ionizing radiation; Laboratories; MOSFET circuits; Microelectronics; Nonvolatile memory; Protons; X-rays; Floating gate memories; proton irradiation; total ionizing dose;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.2007.901199
Filename
4291693
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