• DocumentCode
    1097917
  • Title

    Total Ionizing Dose Effects in NOR and NAND Flash Memories

  • Author

    Cellere, Giorgio ; Paccagnella, Alessandro ; Visconti, Angelo ; Bonanomi, Mauro ; Beltrami, S. ; Schwank, Jim R. ; Shaneyfelt, Marty R. ; Paillet, Philippe

  • Author_Institution
    Padova Univ., Padova
  • Volume
    54
  • Issue
    4
  • fYear
    2007
  • Firstpage
    1066
  • Lastpage
    1070
  • Abstract
    We irradiated floating gate (FG) memories with nor and nand architecture by using different TID sources, including 2 MeV, 98 MeV, and 105 MeV protons, X-rays, and Upsi-rays. Two classes of phenomena are responsible for charge loss from programmed FGs: the first is charge generation, recombination, and transport in the dielectrics, while the second is the emission of electrons above the oxide band. Charge loss from programmed FGs irradiated with protons of different energy closely tracks results from Upsi-rays, whereas the use of X-rays results in dose enhancement effects.
  • Keywords
    electron emission; flash memories; NAND flash memories; NOR flash memories; charge loss; electron emission; total ionizing dose effects; Degradation; Dielectric losses; Dielectric substrates; Ionizing radiation; Laboratories; MOSFET circuits; Microelectronics; Nonvolatile memory; Protons; X-rays; Floating gate memories; proton irradiation; total ionizing dose;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.2007.901199
  • Filename
    4291693