Title :
Complementary p-MODFET and n-HB MESFET (Al,Ga)As transistors
Author :
Kiehl, R.A. ; Gossard, A.C.
Author_Institution :
AT&T Bell Laboratories, Murray Hill, NJ
fDate :
12/1/1984 12:00:00 AM
Abstract :
A complementary transistor structure that utilizes a p-channel modulation-doped FET (p-MODFET) to produce improved p-channel characteristics if reported for the first time. The structure also includes a new type of n-channel MESFET in which the electrons are confined by an n-p heterojunction barrier (n-HB MESFET). The complementary transistor pair is fabricated on a novel MBE-grown n-GaAs/p-(Al,Ga)As/i-GaAs heterostructure. The experimental current-voltage characteristics are presented and demonstrate that this is a promising approach for the development of GaAs-based high-speed complementary logic circuits.
Keywords :
Charge carrier processes; Electron mobility; Epitaxial layers; FETs; Gallium arsenide; Heterojunctions; MESFETs; MODFET circuits; MODFET integrated circuits; Transconductance;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/EDL.1984.26011