DocumentCode :
1098838
Title :
Constraints on the application of 0.5-µm MOSFET´s to ULSI systems
Author :
Takeda, Eiji ; Jones, Geraint A C ; Ahmed, H.
Author_Institution :
Hitachi Ltd., Tokyo, Japan
Volume :
32
Issue :
2
fYear :
1985
fDate :
2/1/1985 12:00:00 AM
Firstpage :
322
Lastpage :
327
Abstract :
The characteristics of a MOSFET with an Leff= 0.5 µm, which is a building element of the next generation of ULSI\´s, are described from two viewpoints: 1) "deviation" from the scaling law and 2) "system level scaling," and are compared with those of 1.3-, 2-, and 3-µm design rules. In the light of the fact that further improvements in the characteristics of small-sized devices are diminishing, it is mentioned that from now on it will be more necessary to concentrate on the system-oriented approach, rather than device and process technologies. In addition, to aid the selection of a new standard for power supply voltage, the allowable operating bias regions in 0.5-µm devices are discussed.
Keywords :
Conductivity; Electron beams; Integrated circuit interconnections; Ion beams; Lithography; MOSFET circuits; Transistors; Ultra large scale integration; Very large scale integration; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1985.21945
Filename :
1484692
Link To Document :
بازگشت