Title :
Direct Analysis Technique for Long-Finger HBT by Electromagnetic and Device Co-Simulation
Author :
Shinohara, Yasuta ; Ishikawa, Ryo ; Honjo, Kazuhiko
Author_Institution :
Univ. of Electro-Commun., Tokyo
fDate :
4/1/2008 12:00:00 AM
Abstract :
This paper presents a direct-analysis technique for transistors with a long-finger structure. The analysis technique is an incorporated simulation between the finite-difference time-domain electromagnetic (EM) and semiconductor device simulations. The co-simulation method can consider various EM couplings and phase shifts on finger electrodes of transistors. The method was applied for InGaP/GaAs HBTs with various finger lengths to investigate gain degradation characteristics as a function of the finger length. As the first step, circuit simulations were done instead of a semiconductor device simulation using SPICE models of the HBT. Both large- and small-signal equivalent-circuit parameters were extracted by measurements to estimate nonlinear and linear characteristics, respectively. Using the extracted small-signal parameters, the gain degradation was estimated. The co-simulation results showed the same tendency as measurement results. Additionally, it was numerically shown that a resistive loss was mainly affected for the gain degradation from a comparison between gold and lossless electrodes.
Keywords :
SPICE; circuit simulation; electromagnetism; equivalent circuits; finite difference time-domain analysis; heterojunction bipolar transistors; semiconductor device models; EM couplings; SPICE models; circuit simulation; device simulation; direct analysis; electromagnetic simulation; equivalent-circuit parameters; finger electrodes; finite-difference time-domain electromagnetic cosimulation; long-finger HBT; phase shifts; semiconductor device cosimulation; Co-simulation; HBT; device simulation; finite difference time domain (FDTD); long-finger transistor; technology computer-aided design (TCAD);
Journal_Title :
Microwave Theory and Techniques, IEEE Transactions on
DOI :
10.1109/TMTT.2008.919080