Title :
The Mobility of Negative Ions in
,

Author :
De Urquijo, Jaime ; Juárez, Antonio M.
Author_Institution :
Inst. de Cienc. Fisicas, Univ. Nac. Autonoma de Mexico, Cuernavaca, Mexico
Abstract :
Using a pulsed Townsend technique, the drift velocity and the mobility of positive ions in C2F4 and C4F8 and those of negative ions in C2F6, CHF3, and CF3I and its mixtures with N2, Ar, and Xe are reported. The overall range of the density-normalized electric field is 4-600 times10-17 - Vldrcm2. Ion identification is provided by means of previous studies on partial ionization and electron attachment. Thus, it is suggested that the predominant drifting ion in the discharge is C2F4 + for C2F4 and c-C4F8, F- for C2F6 and CHF3, and I- for CF3I. The use of more comprehensive theories of ion motion considering the influence of a permanent dipole moment (CHF3 and CF3I) has provided reasonable agreement between low-field measured and calculated mobilities. The mobility of negative ions in CF3I-N2, CF3I-Ar, and CF3I-Xe mixtures agrees reasonably well with the predicted values by Blanc´s law.
Keywords :
Townsend discharge; argon; carbon compounds; fluorine compounds; gas mixtures; ion mobility; ionisation; nitrogen; plasma transport processes; xenon; Blanc law; C2F4; C2F6; C4F8; CF3I-Ar; CF3I-N2; CF3I-Xe; CHF3; density-normalized electric field; discharge; drift velocity; electron attachment; gas mixtures; ion motion theory; negative ion mobility; partial ionization; permanent dipole moment; positive ion mobility; pulsed Townsend technique; Blanc´s law; electronegative gases; gaseous dielectrics; halocarbon gases; mobility and drift velocity; plasma etching; positive and negative ions;
Journal_Title :
Plasma Science, IEEE Transactions on
DOI :
10.1109/TPS.2009.2022362