DocumentCode :
1099040
Title :
Analysis of kink characteristics in Silicon-on-insulator MOSFET´s using two-carrier modeling
Author :
Kato, Koichi ; Wada, Tetsunori ; Taniguchi, Kenji
Author_Institution :
Toshiba Corporation, Kawasaki-shi, Japan
Volume :
32
Issue :
2
fYear :
1985
fDate :
2/1/1985 12:00:00 AM
Firstpage :
458
Lastpage :
462
Abstract :
An exact SOI device simulator applicable to prediction of the transistor characteristics in high-current region is developed. In the simulator, the basic two-dimensional Poisson´s and current continuity equations are numerically solved under steady-state condition. To obtain a stable and rapid convergence in the numerical scheme, a newly developed alternative step solving method is implemented. Using this simulator, the drain current kink effect, a typical phenomenon for substrate-floating devices, is exactly simulated for the first time. The physical mechanism of this phenomenon is also clarified. The simulated results indicate that kink effects are suppressed by using low-lifetime SOI substrates.
Keywords :
Character generation; Charge carrier processes; Dielectric materials; Differential equations; Ionization; MOSFET circuits; Partial differential equations; Poisson equations; Silicon on insulator technology; Spontaneous emission;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1985.21963
Filename :
1484710
Link To Document :
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