DocumentCode :
1099373
Title :
The Hooge parameters of n+-p-n and p+-n-p silicon bipolar transistors
Author :
Zhu, Xichen ; Van Der Ziel, Aldert
Author_Institution :
Kunming Institute of Physics, People´´s Republic of China
Volume :
32
Issue :
3
fYear :
1985
fDate :
3/1/1985 12:00:00 AM
Firstpage :
658
Lastpage :
661
Abstract :
We establish here again the fact that the Hooge parameters of NEC57807 n+-p-n and in GE82 p+-n-p silicon bipolar transistors are orders of magnitude smaller than the value 2 × 10-3postulated earlier. In the NEC57807 devices neither the base 1/ f noise nor the collector 1/ f noise is of the diffusion-fluctuation type. In the GE82 devices the collector 1/ f noise is not of the diffusion-fluctuation type, but the base 1/ f noise is of that type. We have given, also, a theory of the effects of surface recombination fluctuations in the emitter-base space-charge region on the base noise and the collector noise and find a noise spectrum that varies as I_\\gamma where 0.5 < γ < 1.6 when going from small to large currents.
Keywords :
Bipolar integrated circuits; Bipolar transistors; Diodes; Electron emission; Electron mobility; Fluctuations; Frequency; Integrated circuit noise; MOSFETs; Temperature;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1985.21994
Filename :
1484740
Link To Document :
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