DocumentCode
1099379
Title
Hooge parameters for various FET structures
Author
Duh, Kuang Hann ; Van Der Ziel, Aldert
Author_Institution
General Electric Company, Syracuse, NY
Volume
32
Issue
3
fYear
1985
fDate
3/1/1985 12:00:00 AM
Firstpage
662
Lastpage
666
Abstract
We present here values for the Hooge parameters αH of various FET structures that are one or more orders of magnitude smaller than the value 2 × 10-3that was first proposed. It cannot be said for certain which of these values are due to mobility-fluctuation noise and which represent number-fluctuation noise, but it seems reasonable to assume that the lowest values of αH are more likely due to mobility fluctuations.
Keywords
Conductivity; Density estimation robust algorithm; Doping; FETs; Fluctuations; MOSFET circuits; Statistics; Tin; Voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1985.21995
Filename
1484741
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