• DocumentCode
    1099500
  • Title

    Transient latchup in bulk CMOS with a voltage-dependent well-substrate junction capacitance

  • Author

    Fu, K.Y.

  • Author_Institution
    Motorola, Austin, TX
  • Volume
    32
  • Issue
    3
  • fYear
    1985
  • fDate
    3/1/1985 12:00:00 AM
  • Firstpage
    717
  • Lastpage
    720
  • Abstract
    Transient latchup in bulk CMOS with a voltage-dependent well-substrate junction capacitance under a voltage ramp is analyzed. It is found that even when the external voltage is ramping up, α1+ α2> 1, and both bipolar transistors are biased in the forward-active region, the circuit can still dynamically recover internally due to the inherently nonlinear character of the voltage-dependent substrate-well junction capacitance. Numerical results for the cases of linearly graded and step junctions are presented and some optimal conditions for preventing transient latchup are briefly discussed.
  • Keywords
    Bonding; Capacitance; Electrodes; Electrostatics; Insulation; Monitoring; Temperature; Testing; Transconductance; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1985.22006
  • Filename
    1484752