DocumentCode
1099500
Title
Transient latchup in bulk CMOS with a voltage-dependent well-substrate junction capacitance
Author
Fu, K.Y.
Author_Institution
Motorola, Austin, TX
Volume
32
Issue
3
fYear
1985
fDate
3/1/1985 12:00:00 AM
Firstpage
717
Lastpage
720
Abstract
Transient latchup in bulk CMOS with a voltage-dependent well-substrate junction capacitance under a voltage ramp is analyzed. It is found that even when the external voltage is ramping up, α1 + α2 > 1, and both bipolar transistors are biased in the forward-active region, the circuit can still dynamically recover internally due to the inherently nonlinear character of the voltage-dependent substrate-well junction capacitance. Numerical results for the cases of linearly graded and step junctions are presented and some optimal conditions for preventing transient latchup are briefly discussed.
Keywords
Bonding; Capacitance; Electrodes; Electrostatics; Insulation; Monitoring; Temperature; Testing; Transconductance; Voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1985.22006
Filename
1484752
Link To Document