Title :
Micro- and Mesostructures in Plasma Polymers of Trichloroethylene
Author :
Cruz, Guillermo J. ; Olayo, Ma Guadalupe ; Fernandez, Gilberto ; Vasquez-Ortega, Miguelina ; Morales-Corona, Juan ; Olayo, Roberto
Author_Institution :
Dept. de Fis., Inst. Nac. de Investig. Nucl., Mexico City, Mexico
Abstract :
This paper presents a plasma polymerization of trichloroethylene with the objective to study the formation of micro- and mesostructures in the polymers. Under plasma conditions, these polymers have a great potential of building complex self-assembled structures with electrical characteristics ranging from chlorined polyethylenes to polyacetylenes. The polymerization of trichloroethylene was studied with combinations of resistive, capacitive, and inductive electric configurations. Low-power syntheses used dc- and radio-frequency (RF)-resistive mechanisms and resulted in partially soluble polymers with conductivity in the 10-12-10-5-S/cm interval. On the other hand, polymers synthesized at high power with a combined RF inductive-capacitive configuration were almost insoluble with conductivity in the 10-12-10-11-S/cm interval. The morphology of polychloroethylene varied from smooth surfaces to agglomerates composed with micro- and mesostructures with mushroomlike profiles, which were very sensitive to the conditions of synthesis.
Keywords :
conducting polymers; electrical conductivity; organic semiconductors; plasma materials processing; polymer structure; polymerisation; solubility; surface morphology; RF inductive-capacitive electric configuration; agglomerates; chlorined polyethylene; dc-resistive mechanism; electrical conductivity; high power synthesis; low power synthesis; plasma polymerization; plasma polymers; polyacetylene; polychloroethylene morphology; polymer mesostructures; polymer microstructures; radio-frequency-resistive mechanism; self-assembled structures; smooth surface; soluble polymers; trichloroethylene; Chlorined polymers; plasma polymerization; polyacetylene (PA); polyethylene;
Journal_Title :
Plasma Science, IEEE Transactions on
DOI :
10.1109/TPS.2009.2023220