Title :
Self-organized lightwave network based on waveguide films for three-dimensional optical wiring within boxes
Author :
Yoshimura, Tetsuzo ; Inoguchi, Tomoko ; Yamamoto, Takashi ; Moriya, Satoshi ; Teramoto, Yoshihiro ; Arai, Yukihiko ; Namiki, Takefumi ; Asama, Kunihiko
Author_Institution :
Tokyo Univ. of Technol., Japan
Abstract :
This paper presents core technologies for a self-organized microoptical system (SELMOS) within optoelectronic computers; mass-productive fabrication processes of waveguide films and new types of self-organized lightwave networks (SOLNETs) for three-dimensional (3-D) optical wiring with optical Z-connections. Waveguide films are fabricated by the built-in mask method, which is reusable and can construct surface-normal mirrors/filters at one time within photolithographic accuracy. Beveled core edge walls are made by the tilted ultraviolet (UV) exposure through the built-in mask using a photodefinable material. Near- and far-field patterns reveal that the walls act as micromirrors for optical Z-connections. SOLNET is a network consisting of self-organized coupling waveguides between misaligned optical devices. The self-organization is generated in a photorefractive material by self-focusing of the two write beams from the two devices. Direct SOLNET, where wavelengths of the write beam and the signal beam are the same, is demonstrated using a laser diode. Reflective SOLNET, where one of the two write beams is replaced with a reflected write beam from the edge of the coupled device, realizes two-beam-writing SOLNET in a one-beam-writing configuration. It is especially effective when the coupled device cannot transmit write beams. The proof-of-concept is demonstrated both theoretically and experimentally. These results indicate a possibility to form 3-D optical wiring simply in SELMOS.
Keywords :
integrated optoelectronics; laser beams; micromirrors; optical couplers; optical fabrication; optical fibre networks; optical films; optical filters; optical interconnections; optical self-focusing; optical waveguides; photonic switching systems; photorefractive materials; semiconductor lasers; 3-D microoptical switching system; 3-D-stack optoelectronic system; beveled core edge walls; built-in mask method; coupled device; far-field patterns; large-scale integrated circuits; laser diode; mass-productive fabrication processes; micromirrors; misaligned optical devices; near-field patterns; one-beam-writing configuration; optical Z-connections; optical interconnections; optical waveguides; optoelectronic computers; photodefinable material; photolithography accuracy; photorefractive material; self-focusing; self-organization; self-organized coupling waveguides; self-organized lightwave network; self-organized microoptical system; signal beam; surface-normal mirrors/filters; three-dimensional optical wiring; tilted ultraviolet exposure; two-beam-writing SOLNET; waveguide films; write beams; Computer networks; Laser beams; Optical computing; Optical coupling; Optical fiber networks; Optical films; Optical filters; Optical waveguides; Photorefractive materials; Wiring; -D-MOSS; -D-stack optoelectronic system large-scale integrated circuits; Films; SOLNET; optical Z-connections; optical interconnections; optical waveguides; self-organized lightwave network; surface-normal mirrors; three-dimensional microoptical switching system;
Journal_Title :
Lightwave Technology, Journal of
DOI :
10.1109/JLT.2004.833298