DocumentCode
1100333
Title
I /V anomaly and device performance of submicrometre-gate Ga0.47In0.53As/Al0.48In0.52 As HEMT
Author
Kuang, Jente B. ; Tasker, P.J. ; Chen, Y.K. ; Eastman, L.F. ; Aina, O.A. ; Hier, H. ; Fathimulla, A.
Author_Institution
Cornell Univ., Ithaca, NY
Volume
24
Issue
25
fYear
1988
fDate
12/8/1988 12:00:00 AM
Firstpage
1571
Lastpage
1572
Abstract
Discrepancies observed between the DC and RF characteristics of the Ga0.47In0.53As/Al0.48In0.52 As HEMT are presented. Owing to the deep-level electron trapping, the DC I /V curve is distorted and the DC transconductance (g mDC) is severely compressed. The small-signal RF performance is not degraded by this low-frequency phenomenon. RF transconductance (g mRF) of 555 mS/mm and the current gain cut-off frequency (f t) of 102 GHz were obtained
Keywords
III-V semiconductors; aluminium compounds; electron traps; gallium arsenide; high electron mobility transistors; indium compounds; solid-state microwave devices; 102 GHz; 555 mS; DC I/V curve; DC transconductance; EHF; Ga0.47In0.53As-Al0.48In0.52 As; HEMT; I/V anomaly; III-V semiconductors; RF characteristics; RF transconductance; SHF; current gain cut-off frequency; deep-level electron trapping; device performance of submicrometre-gate; low-frequency phenomenon; microwave devices; small-signal RF performance;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
Filename
29222
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