DocumentCode :
1100669
Title :
Novel hot-electron effects in the channel of MOSFET´s observed by capacitance measurements
Author :
Schmitt-Landsiedel, Doris ; Dorda, Gerhard
Author_Institution :
Siemens AG, Munich, Germany
Volume :
32
Issue :
7
fYear :
1985
fDate :
7/1/1985 12:00:00 AM
Firstpage :
1294
Lastpage :
1301
Abstract :
Capacitance-voltage measurements were performed on small-size MOSFET´s with applied drain voltage to obtain information about hot-electron effects. The theoretical analysis shows that hot carriers cause remarkable changes 1) in the vertical and horizontal distribution of the electrons in the inversion layer, 2) in the surface potential drop, 3) in the depletion charge, and 4) in the effective threshold voltage. The influence of these hot-electron effects on the channel current is discussed.
Keywords :
Capacitance measurement; Capacitance-voltage characteristics; Cause effect analysis; Charge carriers; Electron mobility; MOS devices; MOSFET circuits; Parasitic capacitance; Performance evaluation; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1985.22114
Filename :
1484860
Link To Document :
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