DocumentCode :
1101113
Title :
Amplification of 193 nm radiation in argon-fluoride and generation of tunable VUV radiation by high-order anti-Stokes Raman scattering
Author :
Döbele, H.F. ; Röwekamp, M. ; Rückle, B.
Author_Institution :
Universität GH Essen, Essen, West Germany
Volume :
20
Issue :
11
fYear :
1984
fDate :
11/1/1984 12:00:00 AM
Firstpage :
1284
Lastpage :
1287
Abstract :
Tuned narrow-bandwidth UV radiation at 193 nm is generated by SRS of dye laser radiation and is amplified in ArF sections. In a subsequent second hydrogen Raman cell anti-Stokes radiation up to the sixth order (around 130 nm) is generated. Power measurements and calibration are described.
Keywords :
Laser amplifiers; Raman scattering; Ultraviolet generation; Fluorescence; Gas lasers; Hydrogen; Laser beams; Oscillators; Power generation; Power lasers; Pump lasers; Raman scattering; Tunable circuits and devices;
fLanguage :
English
Journal_Title :
Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9197
Type :
jour
DOI :
10.1109/JQE.1984.1072308
Filename :
1072308
Link To Document :
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