DocumentCode :
1101200
Title :
High-gain photodetectors in thin-film transistors fabricated from laser-crystallized silicon on fused silica
Author :
Chiang, Anne ; Johnson, Noble M.
Author_Institution :
Xerox Palo Alto Research Center, Palo Alto, CA
Volume :
32
Issue :
8
fYear :
1985
fDate :
8/1/1985 12:00:00 AM
Firstpage :
1559
Lastpage :
1563
Abstract :
We report the achievement of high-gain photoconduction in transistors fabricated in laser-crystallized silicon thin films on fused silica with responsivities of about 300 A/W for radiation in the visible spectrum. Such photodetectors are potentially useful in page-width linear document input scanners with higher speed and resolution than possible with other thin-film sensor arrays. The basic mechanism for photoconductivity consists of spatial separation of photogenerated electron-hole pairs across a p-n junction in the device body, collection of holes in the floating substrate, and ohmic conduction of electrons in a buried channel. This model predicts a long carrier lifetime and is verified by a photocurrent decay time of about 10-100 µs.
Keywords :
P-n junctions; Photoconductivity; Photodetectors; Semiconductor thin films; Sensor arrays; Silicon compounds; Spatial resolution; Substrates; Thin film sensors; Thin film transistors;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1985.22164
Filename :
1484910
Link To Document :
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