• DocumentCode
    1101200
  • Title

    High-gain photodetectors in thin-film transistors fabricated from laser-crystallized silicon on fused silica

  • Author

    Chiang, Anne ; Johnson, Noble M.

  • Author_Institution
    Xerox Palo Alto Research Center, Palo Alto, CA
  • Volume
    32
  • Issue
    8
  • fYear
    1985
  • fDate
    8/1/1985 12:00:00 AM
  • Firstpage
    1559
  • Lastpage
    1563
  • Abstract
    We report the achievement of high-gain photoconduction in transistors fabricated in laser-crystallized silicon thin films on fused silica with responsivities of about 300 A/W for radiation in the visible spectrum. Such photodetectors are potentially useful in page-width linear document input scanners with higher speed and resolution than possible with other thin-film sensor arrays. The basic mechanism for photoconductivity consists of spatial separation of photogenerated electron-hole pairs across a p-n junction in the device body, collection of holes in the floating substrate, and ohmic conduction of electrons in a buried channel. This model predicts a long carrier lifetime and is verified by a photocurrent decay time of about 10-100 µs.
  • Keywords
    P-n junctions; Photoconductivity; Photodetectors; Semiconductor thin films; Sensor arrays; Silicon compounds; Spatial resolution; Substrates; Thin film sensors; Thin film transistors;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1985.22164
  • Filename
    1484910