DocumentCode :
1101358
Title :
Gate capacitance—Voltage characteristic of MODFET´s: Its effect on transconductance
Author :
Moloney, Michael J. ; Ponse, Frederik ; Morkoç, Hadis
Author_Institution :
Rose-Hulman Institute of Technology, Terre Haute, IN
Volume :
32
Issue :
9
fYear :
1985
fDate :
9/1/1985 12:00:00 AM
Firstpage :
1675
Lastpage :
1684
Abstract :
Gate capacitance Cgin modulation-doped field-effect transistors (MODFET\´s) is one of the most important parameters for small- and large-signal applications as well as for understanding device operation at dc and high frequencies. We have modeled the gate capacitance-voltage characteristics of AlGaAs/GaAs MODFET\´s and obtained good agreement with experiments at 300 and 77 K. Rigorous numerical simulations relating the Fermi level at the GaAs/AlGaAs heterointerface to the two-dimensional electron gas (2DEG) concentrations were fitted with analytical functions to simplify the model. The fit is quite reasonable with an accuracy of 1 percent in a wide range of sheet carrier concentrations. By incorporating AlGaAs charge response to gate voltage near full turn-on, discrepancies between the experiments and earlier models (predicting a nearly constant capacitance-voltage characteristic) were minimized. The model also shows that the C_{g}(V) characteristic below threshold is governed by the doping level in the buffer layer, in the intermediate region by the 2DEG and near complete turn-on by the 2DEG and the AlGaAs layer. Considering the contribution of the AlGaAs layer, a detailed RC network was developed. The model also explains the rise in capacitance and fall in the transconductance for large forward gate voltages (low frequency) due basically to the contribution of AlGaAs to the gate capacitance but almost no contribution to the current conduction. In contrast, the transconductance and capacitance both increase in MESFET\´s.
Keywords :
Capacitance; Capacitance-voltage characteristics; Epitaxial layers; FETs; Frequency; Gallium arsenide; HEMTs; MODFETs; Semiconductor process modeling; Transconductance;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1985.22179
Filename :
1484925
Link To Document :
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