DocumentCode :
1101418
Title :
Emitter—Base bandgap grading effects on GaAlAs/GaAs heterojunction bipolar transistor characteristics
Author :
Yoshida, Jiro ; Kurata, Mamoru ; Morizuka, Kohei ; Hojo, Akimicmi
Author_Institution :
Toshiba Research and Development Center, Kawasaki, Japan
Volume :
32
Issue :
9
fYear :
1985
fDate :
9/1/1985 12:00:00 AM
Firstpage :
1714
Lastpage :
1721
Abstract :
Emitter-base bandgap grading effects on GaAlAs/GaAs heterojunction bipolar transistor characteristics are theoretically investigated using an accurate one-dimensional numerical model including aluminum mole-fraction-dependent velocity versus field characteristics and donor energy level. The bandgap grading is shown to influence not only the electron injection but also the carrier recombination and the hole injection, resulting in a significant common-emitter current gain dependence on the graded layer thickness. The cutoff frequency dependence on the graded layer thickness is also described. Detailed discussion is given for the underlying physical mechanism that determines the device performance.
Keywords :
Aluminum; Bipolar transistors; Charge carrier processes; Cutoff frequency; Electron mobility; Equations; Gallium arsenide; Heterojunction bipolar transistors; Numerical models; Photonic band gap;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1985.22185
Filename :
1484931
Link To Document :
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