DocumentCode :
1101439
Title :
Role of defect size distribution in yield modeling
Author :
Ferris-Prabhu, Albert V.
Author_Institution :
IBM Corporation, Essex Junction, VT
Volume :
32
Issue :
9
fYear :
1985
fDate :
9/1/1985 12:00:00 AM
Firstpage :
1727
Lastpage :
1736
Abstract :
Most publications on yield modeling for large-scale integrated circuits have concerned themselves only with the role of the spatial distribution of defects. While it was recognized that the size of the defects affected the yield, the role of the size distribution does not appear to have been fully investigated. This paper examines the effect of different assumptions concerning the defect size distribution and shows that they exert a strong effect on the projected yield. It is also shown that attempts to determine the defect size distribution from yield data are subject to fundamental limitations that need to be addressed.
Keywords :
Circuit faults; Information geometry; Insulation; Large-scale systems; Manufacturing; Metal-insulator structures; Poisson equations; Probability; Silicon; Statistical distributions;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1985.22187
Filename :
1484933
Link To Document :
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