DocumentCode
1101558
Title
Three-dimensional photoresist image simulation on flat surfaces
Author
Matsuzawa, Toshiharu ; Ito, Tetsuo ; Tanuma, Masaya
Author_Institution
Hitachi Ltd., Tokyo, Japan
Volume
32
Issue
9
fYear
1985
fDate
9/1/1985 12:00:00 AM
Firstpage
1781
Lastpage
1783
Abstract
A simulation procedure for three-dimensional (3-D) photoresist images on flat substrates is developed. The procedure consists of three parts, i.e., two-dimensional (2-D) distribution of projected light intensity, 3-D photosensitizer concentration distribution, and 3-D photoresist development. For the former two simulations, conventional procedures have been employed. The last development simulation is carried out by extending the ray tracing model to three dimensions. A successful result is obtained for the resist system with a weak standing-wave effect.
Keywords
Computational modeling; Geometrical optics; Helium; Indium tin oxide; Laboratories; Ray tracing; Refractive index; Resists; Solid modeling; Two dimensional displays;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1985.22197
Filename
1484943
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