DocumentCode :
1101779
Title :
Analytical model for predicting threshold voltage in submicrometer-channel MOSFET´s
Author :
Tang, Ting Wei ; Zhang, Qian Ling ; Navon, David H.
Author_Institution :
University of Massachusetts, Amherst, MA
Volume :
32
Issue :
9
fYear :
1985
fDate :
9/1/1985 12:00:00 AM
Firstpage :
1890
Lastpage :
1893
Abstract :
A quasi-two-dimensional analytical closed-form determination of the threshold voltage has been derived for submicrometer-channel-length MOSFET´s. The invalid assumption of uniform depletion-layer width made in a prior similar computation has been corrected. A comparison between the results of previous extensive two-dimensional numerical analyses and the present analysis proves that the present model is quite accurate.
Keywords :
Amorphous materials; Analytical models; Annealing; Capacitance-voltage characteristics; Electric variables measurement; Gaussian distribution; Heat treatment; Implants; Solid modeling; Threshold voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1985.22216
Filename :
1484962
Link To Document :
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