Title :
A simple model for predicting contrast in photoresists
Author :
Babu, S.V. ; Srinivasan, V.
Author_Institution :
Clarkson University, Potsdam, NY
fDate :
9/1/1985 12:00:00 AM
Abstract :
A simple model that predicts the contrast of positive and negative photoresists, given the optical absorption of the resist and the spectral emission intensity of the exposing tool, is proposed. Predictions for Kodak-747 Microresist, AZ2400, PR102, and Dupont Elvacite 2041PMMA resists are excellent. The model is equally applicable to exposures involving pulsed excimer laser radiation.
Keywords :
Absorption; Equations; Optical films; Optical pulses; Predictive models; Resists; Solvents; Stimulated emission; Substrates; Wavelength measurement;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1985.22218
