DocumentCode
1101955
Title
COMPOSITE—A complete modeling program of silicon technology
Author
Lorenz, Jurgen ; Pelka, Joachim ; Ryssel, Heiner ; Sachs, Albert ; Seidl, Albert ; Svoboda, Milos
Author_Institution
Fraunhofer-Arbeitgsgruppe für Integrierte Schaltungen (AIS), Erlangen, Germany
Volume
32
Issue
10
fYear
1985
fDate
10/1/1985 12:00:00 AM
Firstpage
1977
Lastpage
1986
Abstract
A new two-dimensional process modeling program written in Fortran is described. For the first time, this program allows the simulation of all important processing steps occuring in typical sequences involved in the fabrication of integrated circuits such as doping, oxidation, lithography, etching, and layer deposition. The program possesses a modular structure to allow for easy changing and improvement of process models as well as of mathematical procedures. The program is menu driven to make it easy to use for non-experts and it is readily usable with different computer systems.
Keywords
Circuit simulation; Doping; Etching; Fabrication; Integrated circuit technology; Lithography; Mathematical model; Oxidation; Semiconductor process modeling; Silicon;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1985.22230
Filename
1484976
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