DocumentCode
1102305
Title
Determination of the temporal plasma density above a semiconductor bridge
Author
Kim, J. ; Song, Y.-H. ; Nam, K.-S.
Author_Institution
Semicond. Div., Electron. & Commun. Res. Inst., Taejon, South Korea
Volume
32
Issue
15
fYear
1996
fDate
7/18/1996 12:00:00 AM
Firstpage
1412
Lastpage
1413
Abstract
A new method of determining the temporal plasma density above a semiconductor bridge using a microwave resonator probe has been proposed. Experimental results indicate that the plasma density is observed to increase to a peak value of 4.2×1011 cm-1 and decay exponentially with time, which is consistent with diffusion dominating the plasma transport
Keywords
microwave measurement; plasma density; plasma probes; plasma production; plasma transport processes; semiconductor devices; diffusion; microwave resonator probe; plasma transport; semiconductor bridge; temporal plasma density;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19960899
Filename
511153
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