DocumentCode :
1102315
Title :
Evaluation of base transit time in ultra-thin carbon-doped base InP/lnGaAs heterojunction bipolar transistors
Author :
Ito, H. ; Yamahata, S. ; Kurishima, K.
Author_Institution :
NTT LSI Labs., Kanagawa, Japan
Volume :
32
Issue :
15
fYear :
1996
fDate :
7/18/1996 12:00:00 AM
Firstpage :
1413
Lastpage :
1415
Abstract :
Electron transit times in the carbon-doped base of InP/InGaAs heterojunction bipolar transistors (HBTs) are investigated from the current gains. The base layers were heavily doped to 2.5×1019 cm-3 and the thicknesses WB were varied from 50 to 1300 Å. The estimated base transit time τB shows linear dependence on WB when WB is smaller than 150 Å, whereas it has quadratic dependence on WB above this value. The linear behaviour of τB on W B is evidence of dominant ballistic electron transport in the ultra-thin base layer of InP/InGaAs HBTs
Keywords :
III-V semiconductors; carbon; gallium arsenide; heavily doped semiconductors; heterojunction bipolar transistors; indium compounds; InP-InGaAs:C; InP/lnGaAs heterojunction bipolar transistor; ballistic electron transport; current gain; electron transit time; heavily doped layer; ultra-thin carbon-doped base;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19960914
Filename :
511154
Link To Document :
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