Effect of Post-Annealing on the Magnetic Properties of Bi:YIG Film by RF Magnetron Sputtering on Si Substrates

Author

Yang, Qinghui ; Huaiwu, Zhang ; Yingli, Liu ; Qiye, Wen

Author_Institution

Univ. of Electron. Sci. & Technol. of China, Sichuan

Volume

43

Issue

9

fYear

2007

Firstpage

3652

Lastpage

3655

Abstract

We deposited amorphous Bi:YIG film on Si substrates by radio-frequency (RF) magnetron sputtering and crystallized it by the recurrent rapid thermal annealing (RRTA) method. We studied the effects of heating temperature on the crystallization, surface condition, and magnetic properties of the films using X-ray diffraction, an atomic force microscope, and a vibrating sample magnetometer. We also examined the effects of atmosphere and the recurrent period on the films. Our results show that the RRTA method yields film with good magnetic properties, with saturation magnetization of 1750 Gs and coercive force of 80 Oe and good surface condition.

Keywords

X-ray diffraction; atomic force microscopy; bismuth; coercive force; crystallisation; garnets; magnetic thin films; rapid thermal annealing; sputter deposition; surface potential; yttrium compounds; RF magnetron sputtering; Si - Surface; X-ray diffraction; YIG:Bi - System; amorphous film deposition; atomic force microscope; coercive force; crystallization; heating; post-annealing; rapid thermal annealing; saturation magnetization; surface property; vibrating sample magnetometer; Amorphous magnetic materials; Atomic force microscopy; Crystallization; Magnetic films; Magnetic properties; Radio frequency; Saturation magnetization; Semiconductor films; Sputtering; Substrates; Bi:YIG film; RF magnetron sputtering; coercive force; recurrent rapid thermal annealing; saturation magnetization;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/TMAG.2007.900979

Filename

4292322