We develop a model which describes the current-voltage characteristics of GaAs saturated resistor loads (or ungated FET\´s) with uniform and nonuniform (ion-implanted) doping profiles. The results of the calculation are in good agreement with the experimental data for 1-, 2-, and 3-µm GaAs ungated FET\´s. Our model allows us to determine the values of the electron saturation velocity ν
sand of the surface built-in voltage V
Sbifrom the measured current-voltage characteristics of ungated loads. For long devices (with 3-µm length) we obtain

m/s and

V, in good agreement with expected values. For shorter (1 µm) devices, the measured values of ν
sare considerably higher (1.64-1.73 × 10
5m/s). This may be considered as evidence of velocity enhancement in short structures due to ballistic or overshoot effects.