DocumentCode :
1102951
Title :
IIB-5 ultrashallow p+-n junctions suitable for VLSI CMOS
Author :
Sigmon, T.W.
Volume :
32
Issue :
11
fYear :
1985
fDate :
11/1/1985 12:00:00 AM
Firstpage :
2532
Lastpage :
2533
Keywords :
Boron; Fabrication; Gas lasers; Implants; Ion implantation; Resists; Surface cleaning; Tail; Thermal resistance; Very large scale integration;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1985.22319
Filename :
1485065
Link To Document :
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