DocumentCode :
1103204
Title :
An analytical model for high electron mobility transistors
Author :
Ahn, Hyungkeun ; El Nokali, Mahmoud
Author_Institution :
Dept. of Electr. Eng., Pittsburgh Univ., PA, USA
Volume :
41
Issue :
6
fYear :
1994
fDate :
6/1/1994 12:00:00 AM
Firstpage :
874
Lastpage :
878
Abstract :
In this paper we present a new model for HEMT´s which is based on a single analytical function that describes the electron concentrations in the two dimensional electron gas and in the AlGaAs layer. Besides accounting for the AlGaAs conduction, the model includes the effect of mobility degradation, channel length modulation in the saturation region and the series resistances RS and RD. The model results in closed form expressions for the current, transconductance, output conductance and gate capacitance. Finally, the theoretical predictions of the model are compared with the experimental data and shown to be in good agreement over a wide range of bias conditions
Keywords :
capacitance; carrier density; carrier mobility; gallium arsenide; high electron mobility transistors; semiconductor device models; two-dimensional electron gas; 2DEG; AlGaAs conduction; AlGaAs-GaAs; HEMT; analytical model; channel length modulation; current; electron concentrations; gate capacitance; high electron mobility transistors; mobility degradation; output conductance; saturation region; series resistances; transconductance; two dimensional electron gas; Analytical models; Capacitance; Degradation; Electron mobility; Gallium arsenide; HEMTs; MODFETs; Photonic band gap; Predictive models; Transconductance;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.293295
Filename :
293295
Link To Document :
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