Title :
Deep cryogenic noise and electrical characterization of the complementary heterojunction field-effect transistor (CHFET)
Author :
Cunningham, Thomas J. ; Gee, Russell C. ; Fossum, Eric R. ; Baier, Steven M.
Author_Institution :
Jet Propulsion Lab., California Inst. of Technol., Pasadena, CA, USA
fDate :
6/1/1994 12:00:00 AM
Abstract :
This paper discusses a characterization at 4 K of the complementary heterojunction field-effect transistor (CHFET), to examine its suitability for deep cryogenic (<10 K) readout electronics applications. The CHFET is a GaAs-based transistor analogous in structure and operation to silicon CMOS. The electrical properties including the gate leakage current, subthreshold transconductance, and input-referred noise voltage were examined. It is shown that both n-channel and p-channel CHFET´s are fully functional at 4 K, with no anomalous behavior, such as hysteresis or kinks. Complementary circuit designs are possible, and a simple CHFET-based multiplexed op-amp is presented and characterized at 4 K. The noise and gate leakage current of the CHFET are presently several orders of magnitude too large for readout applications, however. The input-referred noise is on the order of 1 μV/√(Hz) at 100 Hz for a 50×50 μm n-channel CHFET. The gate current is strongly dependent on the doping at the gate edge, and is on the order of 10-14 A for a 10×10 μm 2 n-channel CHFET with light gate-edge region doping
Keywords :
cryogenics; field effect transistors; gallium arsenide; leakage currents; semiconductor device noise; semiconductor device testing; 4 K; CHFET; GaAs; GaAs-based transistor; complementary heterojunction FET; deep cryogenic noise; electrical characterization; field-effect transistor; gate leakage current; input-referred noise voltage; multiplexed op-amp; n-channel device; p-channel device; readout electronics applications; subthreshold transconductance; Circuit noise; Cryogenics; Doping; FETs; Heterojunctions; Leakage current; Readout electronics; Silicon; Transconductance; Voltage;
Journal_Title :
Electron Devices, IEEE Transactions on